Electron Beam Lithography

Electron Beam Lithography (EBL) is a precise technique used to create extremely small patterns, often at the nanoscale, on surfaces. It works by focusing a beam of electrons onto a special material called a resist, which changes in response. This allows scientists and engineers to design intricate structures for applications in electronics, nanotechnology, and medicine. EBL offers high resolution, making it essential for fabricating components like microprocessors and sensors. Although slower and more expensive than traditional methods, EBL enables advancements in technology that require detailed features and high precision.