E-beam resist

E-beam resist is a specialized material used in microfabrication to create tiny, precise patterns on circuits or surfaces. It is a photosensitive coating that changes properties when exposed to a focused electron beam, allowing engineers to selectively remove or modify areas. This process enables the fabrication of extremely small and complex features found in advanced electronics and semiconductor devices. E-beam resist provides high resolution and precision, making it essential for manufacturing at the nanometer scale. It acts as a temporary mask during etching or deposition, facilitating the creation of intricate microstructures efficiently and accurately.