Lithography Process Optimization

Lithography process optimization involves fine-tuning the steps used to create tiny patterns on semiconductor wafers, which are the base for microchips. The goal is to improve accuracy, resolution, and manufacturing efficiency while reducing defects and costs. This includes adjusting variables such as light exposure, material properties, and equipment settings to achieve precise pattern transfer at increasingly smaller scales. Effective optimization ensures high-quality chips with better performance and reliability, enabling the advancement of electronics like smartphones, computers, and advanced sensors.