Electron Beam Resist Development

Electron beam resist development is a process used in microfabrication to create tiny, precise patterns on a material. An electron beam selectively exposes a specialized coating (resist) on the surface, changing its chemical properties. After exposure, the material is immersed in a developer solution that removes either the exposed or unexposed areas, depending on the resist type. This reveals a detailed pattern that can be used for further manufacturing steps, such as etching or depositing other materials. The process allows for extremely high-resolution patterning essential in advanced electronics and nanotechnology.