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ALD process

Atomic Layer Deposition (ALD) is a precision process used to create very thin layers of materials, atom by atom. It involves alternating exposure of a surface to two different gases, which react to form a thin film. This method allows for excellent control over the thickness and uniformity of the layers, making it ideal for applications in electronics, nanotechnology, and coatings. ALD is praised for its ability to coat complex shapes and achieve consistent results, even at the nanoscale. It plays a crucial role in developing advanced materials for modern technology.

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    Atomic Layer Deposition (ALD) is a precise technique used to create extremely thin films, often just a few nanometers thick, on surfaces. It works by alternating between two chemicals, which react on the surface layer by layer. This controlled process ensures uniform coating, even on intricate shapes. ALD is crucial in industries such as electronics, where it helps produce faster, smaller components, and in other fields like solar cells and nanotechnology. Its ability to form uniform coatings at a molecular level makes it a valuable tool for advancing modern technology.