Atomic Layer Deposition (ALD)

Atomic Layer Deposition (ALD) is a precise method for applying thin films of materials onto surfaces, often at the atomic level. It works through a series of chemical reactions, where alternating gases are introduced into a chamber. Each gas layer reacts with the surface, adding one atomic layer at a time. This technique allows for exceptional control over thickness and uniformity, making it popular in fields like electronics, solar cells, and nanotechnology. ALD is valuable for producing advanced materials with specific properties, ensuring consistency even on complex shapes and very small structures.