Sputter Depth Profiling

Sputter depth profiling is a scientific technique used to analyze the composition of materials layer by layer. It involves bombarding a sample's surface with energetic ions, which removes thin layers of material one at a time. As each layer is sputtered away, the composition is measured, allowing scientists to see how the material's properties change from the surface down to deeper layers. This is valuable in fields like materials science and semiconductor manufacturing, where understanding layer structures can impact performance and quality. It helps researchers learn about coatings, contaminants, and the distribution of elements within a material.