ALD reactors

Atomic Layer Deposition (ALD) reactors are specialized devices used to apply very thin layers of material onto surfaces at the atomic level. They work by alternating between two or more gaseous precursors that react sequentially on a substrate, forming a precise layer with atomic thickness. This technique is crucial in industries like electronics and nanotechnology, where precise control over material properties is essential. ALD allows for uniform coatings even on complex shapes, leading to advancements in semiconductors, solar cells, and more, ensuring high performance and efficiency in various applications.