Plasma ALD

Plasma Atomic Layer Deposition (ALD) is a sophisticated technique used to create extremely thin coatings of materials on surfaces at the atomic level. It involves exposing a surface to alternating gases, which react to form a thin layer of material, one atomic layer at a time. The addition of plasma enhances the process, enabling better control over the film’s properties and uniformity, even on complex shapes. Plasma ALD is widely used in industries such as electronics and nanotechnology, where precise coatings are essential for improving device performance and enabling new functionalities.