Chemical ALD

Chemical Atomic Layer Deposition (ALD) is a method used to create thin films of materials one atomic layer at a time. It involves alternating between two different gases that react on a surface, depositing material very precisely. This process allows for incredibly uniform and controlled coatings, which are vital in industries like electronics, optics, and nanotechnology. ALD is particularly useful for making components in smartphones and computers, where precise control over thickness and composition is crucial for performance and reliability. This technique enables advancements in technology by improving the performance of various devices.