ALD Techniques

Atomic Layer Deposition (ALD) is a precise method for creating very thin, uniform coatings on surfaces at the atomic scale. It involves exposing a surface to alternating chemical pulses that react and form a single atomic layer each cycle. This step-by-step process allows for exceptional control over the coating's thickness and composition, making it ideal for advanced electronics, sensors, and protective layers. ALD's unique ability to deposit conformal, high-quality films on complex or porous structures sets it apart from other deposition techniques, ensuring consistent, reliable coatings essential for high-performance applications.