Hybrid ALD

Hybrid Atomic Layer Deposition (ALD) is a precise method for creating ultra-thin, uniform thin films on surfaces. It combines the traditional ALD process with additional chemical techniques, often involving organic molecules or different energy sources, to enhance film properties or enable new functionalities. This approach allows for better control over film composition and structure, making it useful in electronics, coatings, and nanotechnology. Essentially, hybrid ALD leverages the strengths of multiple methods to produce high-quality coatings with tailored characteristics for advanced applications.