ALD

ALD 101, or "Atomic Layer Deposition," is a precise method of thin film deposition used in various applications, such as electronics and materials science. This technique involves depositing layers of material one atom or molecule at a time, allowing for exceptional control over thickness and uniformity. ALD is particularly valuable in creating complex structures on surfaces, enabling advancements in semiconductor manufacturing, coatings, and nanotechnology. Its ability to produce high-quality films with minimal waste makes it an essential tool in modern technology development.