Chemical Vapor Deposition (CVD)

Chemical Vapor Deposition (CVD) is a manufacturing process used to create thin films or coatings on a surface. In CVD, gaseous chemicals are introduced into a reaction chamber, where they react to form solid material that deposits onto a substrate, like a silicon wafer. This technique is commonly used in the production of semiconductors, solar cells, and advanced materials. CVD allows for precise control over the thickness and composition of the coatings, making it essential for creating high-performance electronic devices and coatings with specific properties.