reactive sputtering

Reactive sputtering is a process used to create thin films of material on surfaces. It involves bombarding a target material with energetic particles in a vacuum chamber, causing atoms to be ejected from the target. When reactive gases (like oxygen or nitrogen) are introduced, these ejected atoms can react with the gas to form a compound that deposits onto a substrate, creating a coating. This technique is widely used in various industries for producing coatings that enhance properties like durability, conductivity, or optical qualities, making it essential in electronics, optics, and protective materials.