ion beam sputtering

Ion beam sputtering is a physical process used to remove material from a solid surface. It involves directing a beam of charged particles (ions) at the material, which causes atoms on the surface to be ejected or "sputtered" away. This technique is often used for creating thin films, coatings, or in semiconductor manufacturing. By adjusting the energy of the ions and the angle of the beam, precise control over the material removal can be achieved, allowing for detailed and accurate modifications to surfaces in applications ranging from electronics to optics.