E-beam Lithography

E-beam lithography is a high-precision technique used to create tiny patterns on surfaces, often for electronics or nanotechnology. It involves directing a focused beam of electrons onto a special coating called a resist, which changes properties when hit by electrons. This allows for the creation of intricate designs at scales much smaller than visible light can achieve. After exposure, the resist is developed to reveal the pattern, which can then be used to etch or deposit materials onto a substrate. E-beam lithography is essential for making advanced devices like microchips and nanoscale components.