EBL (Electron Beam Lithography)

Electron Beam Lithography (EBL) is a precise technique used to create tiny patterns on materials, often for making microchips or nanostructures. It uses a focused beam of electrons to directly write complex designs onto a special surface coated with a sensitive material called a resist. The electrons alter the resist’s properties, allowing targeted areas to be developed away or protected. This method offers extremely high resolution, enabling the fabrication of features much smaller than what traditional light-based methods can achieve. EBL is essential in research and development for advanced electronics, photonics, and nanotechnology.