ALD Thin Films

Atomic Layer Deposition (ALD) is a precise technique used to create very thin layers of materials, often only a few atoms thick. It works by alternately exposing a surface to different gases, which react and form a layer one atom thick at a time. This method allows for excellent control of the thickness and uniformity of the films, making it ideal for applications in electronics, solar cells, and other technologies. ALD is valued for its ability to coat complex shapes and surfaces uniformly, leading to improved performance and efficiency in various products.