CVD (Chemical Vapor Deposition)

Chemical Vapor Deposition (CVD) is a process used to produce thin films or coatings on materials by exposing a substrate to reactive gases at high temperatures. These gases react or decompose on the surface, forming a solid material that coats the substrate evenly. CVD is widely used in manufacturing semiconductors, coatings, and advanced materials due to its ability to create high-quality, uniform, and precisely controlled thin layers. It involves careful control of temperature, pressure, and gas composition to achieve the desired coating properties, essential for electronics, energy devices, and protective surfaces.