RF Plasma

RF plasma, or Radio Frequency plasma, is a state of matter created when a gas is energized by radio waves. This energy causes the gas atoms to ionize, resulting in a mixture of charged particles—ions and electrons. RF plasma is widely used in various applications, such as in semiconductor manufacturing for etching and deposition, in medical treatments for sterilization, and in surface modifications to improve material properties. Its ability to operate at low temperatures while effectively interacting with materials makes it versatile and valuable in many scientific and industrial processes.