Plasma Enhanced CVD

Plasma Enhanced Chemical Vapor Deposition (PECVD) is a process used to create thin films of materials, often for electronics and solar cells. It involves using plasma, a state of matter similar to gas but with charged particles, to energize chemical gases. This energy helps the gases react and form a solid layer on a surface. PECVD can produce high-quality films at lower temperatures than traditional methods, making it versatile for a variety of substrates. It’s valuable in industries for improving the performance and durability of components like semiconductors and coatings.