plasma-enhanced chemical vapor deposition

Plasma-enhanced chemical vapor deposition (PECVD) is a process used to create thin, high-quality coatings on surfaces. It involves introducing gases into a chamber where a plasma—a state of ionized, energized particles—is generated using electrical energy. This plasma helps break down the gases more efficiently, allowing atoms or molecules to settle and form a thin film on the target material. PECVD enables deposition at lower temperatures and with better control, making it useful for producing coatings in electronics, solar cells, and protective layers, balancing efficiency with precision in material fabrication.