Spin Coating

Spin coating is a technique used to apply thin, even layers of liquid material, such as polymers or photoresists, onto a flat surface, often a silicon wafer. During the process, the substrate is placed on a spinning turntable, and the liquid is dropped onto it. The rapid spinning causes the liquid to spread evenly outward due to centrifugal force, creating a uniform layer as the excess liquid is flung off the edges. This method is widely used in electronics, optics, and materials science for producing coatings with precise thickness, essential for various applications such as semiconductors and solar cells.