Tof-SIMS (Time-of-Flight Secondary Ion Mass Spectrometry)

Tof-SIMS (Time-of-Flight Secondary Ion Mass Spectrometry) is a powerful analytical technique used to analyze the surface of materials. It works by bombarding a sample with a focused primary ion beam, which ejects tiny fragments called secondary ions from the surface. These ions are then collected and measured based on their mass-to-charge ratio using a time-of-flight detector. The time it takes for ions to reach the detector helps identify their mass, enabling detailed analysis of the surface’s composition, structure, and chemical states at a microscopic scale.