SIMS (Secondary Ion Mass Spectrometry)

Secondary Ion Mass Spectrometry (SIMS) is an analytical technique used to analyze the composition of a material's surface. It involves bombarding the surface with a focused primary ion beam, which causes the ejection of secondary ions from the surface layer. These ions are then collected and measured by a mass spectrometer, allowing for detailed information about the elements and isotopes present, as well as their distribution. SIMS is highly sensitive and can detect trace amounts, making it valuable for materials research, geology, and semiconductor analysis.