Plasma Chemical Vapor Deposition (CVD)

Plasma Chemical Vapor Deposition (CVD) is a process that uses plasma—a highly energized state of gas—to create thin, solid films on surfaces. In this method, gases containing the desired materials are introduced into a chamber where a plasma is generated. The plasma activates chemical reactions, causing the gases to decompose and form a thin coating directly on a substrate, like a metal or glass. This technique allows for precise control of coating properties, often improving surface durability, conductivity, or other features, and is widely used in electronics, coatings, and material science.