PECVD (Plasma-Enhanced Chemical Vapor Deposition)

Plasma-Enhanced Chemical Vapor Deposition (PECVD) is a process used to create thin films of material on surfaces, often for electronics or solar cells. It involves using a gas mixture that is transformed into a plasma, which is a state of matter where gas particles are energized. This plasma helps chemical reactions occur at lower temperatures than traditional methods. The result is a uniform coating of desired materials, such as silicon, onto various substrates. PECVD is valued for its ability to produce high-quality films with specific properties for advanced technologies.