ion implantation

Ion implantation is a process used in manufacturing electronic components where ions (charged atoms) are accelerated and embedded into a material, usually a semiconductor like silicon. This technique modifies the material’s properties, such as electrical conductivity, by precisely placing ions at specific depths. It involves ionizing the dopant atoms, accelerating them with an electric field, and directing them into the target. Ion implantation allows for accurate control of dopant concentration and distribution, essential for creating complex semiconductor devices like transistors, used in computers and smartphones.