Epitaxial Growth Techniques

Epitaxial growth techniques involve depositing a thin, precise layer of material onto a crystalline substrate, aligning atomically with the underlying structure. This process is essential in manufacturing high-quality semiconductor devices, such as transistors and solar cells. Common methods include Chemical Vapor Deposition (CVD), where gaseous chemicals react on a heated surface to form the layer, and Molecular Beam Epitaxy (MBE), which uses directed beams of atoms in ultra-high vacuum for precise control. These techniques enable the production of uniform, defect-free layers with specific electrical and optical properties, crucial for advanced electronics.