ArF Laser (Argon Fluoride Laser)

An ArF (Argon Fluoride) laser is a type of ultraviolet laser that uses a mixture of argon and fluorine gases to produce very short, high-energy light pulses at a wavelength of 193 nanometers. It operates by exciting the gas mixture with electrical energy, which causes the atoms to emit precise, coherent ultraviolet light. This laser is commonly used in advanced applications like semiconductor manufacturing and dermatology, where its ability to precisely etch or treat materials at a microscopic scale is essential. Its short wavelength allows for high-resolution precision, making it valuable in fields requiring meticulous detail.