ALD in Nanotechnology

Atomic Layer Deposition (ALD) is a precise technique used in nanotechnology to create extremely thin films of materials, one atomic layer at a time. This process involves alternating exposures of a substrate to different gases, which react to form a layer on the surface. It allows for precise control over thickness and composition, making it ideal for applications in electronics, optics, and coatings. ALD is significant for producing advanced materials with enhanced properties, enabling innovations in devices like semiconductors, solar cells, and batteries, thus playing a crucial role in the development of modern technology.