ALD for Nanostructures

Atomic Layer Deposition (ALD) is a precise technique used to create extremely thin layers of material, atom by atom. This process is essential in making nanostructures, which are tiny structures at the nanoscale, often just a few billionths of a meter in size. ALD allows for uniform coatings on complex surfaces, improving the performance of electronic devices, sensors, and catalysts. By controlling the thickness at the atomic level, researchers can enhance materials’ properties, enabling innovations in technology such as advanced microchips and batteries.