RIE (Reactive Ion Etching)

Reactive Ion Etching (RIE) is a precise process used in manufacturing to remove layers from a material, typically in making microchips. It combines reactive gases and an electric field to produce ions that attack and break down specific areas of a surface. The ions are directed onto the material, etching away unprotected regions with high accuracy. This technique allows for detailed and controlled shaping of tiny structures, essential for creating modern electronic components. RIE offers anisotropic etching, meaning it etches mainly in one direction, enabling intricate patterns and fine features to be manufactured reliably.