reactive ion etching (RIE)

Reactive Ion Etching (RIE) is a precise process used in manufacturing electronic and microchip components. It uses a combination of reactive gases and an electric field to remove specific material from a surface at a microscopic level. The gases react chemically with the target material, creating volatile byproducts that are then physically driven away by the electric field. This technique allows for highly accurate patterning and shaping of tiny structures, essential for modern technology. RIE offers control over etch depth and profile, making it a vital tool in producing intricate microstructures with high precision.