plasma-assisted chemical vapor deposition (PACVD)

Plasma-assisted chemical vapor deposition (PACVD) is a process used to create thin, precise coatings or films on surfaces. It involves generating a plasma—a state of matter similar to gas but with energetic charged particles—using electrical energy. This plasma activates chemical reactions that cause gases, containing the desired coating material, to decompose and settle onto a substrate, forming a uniform film. PACVD allows for better control over material properties, coating adhesion, and deposition at lower temperatures, making it useful in industries like electronics, biomedical devices, and protective coatings.