Maskless Lithography

Maskless lithography is a technique used to create very small patterns on materials like silicon wafers without using traditional masks. Instead, it directly writes or projects the desired pattern onto the surface using focused beams of light, electrons, or ions. This method offers flexibility, quicker setup for different designs, and cost savings, especially for prototype or low-volume production. It eliminates the need for creating physical masks, reducing manufacturing time and expenses. Maskless lithography is important in developing advanced electronics and nanotechnology, enabling precise patterning at extremely small scales.