Maskless Etching

Maskless etching is a process used in manufacturing to carve patterns into materials like silicon without using a physical mask or stencil. Instead, advanced techniques, such as focused ion beams or electron beams, directly target specific areas to remove or modify material. This approach allows for highly precise, customizable patterning without the need for creating masks, making it ideal for complex, small-scale, or one-off designs. It enhances flexibility and reduces preparation time, especially in research and development or in producing customized electronic components.