Ion-assisted deposition

Ion-assisted deposition is a process used to create thin, high-quality coatings on surfaces. It involves directing energetic ions—charged particles—toward a material being deposited, which helps improve the coating’s adhesion, density, and uniformity. As the coating material is vaporized and settles onto the surface, the ions bombard it, promoting better bonding and reducing defects. This technique is commonly used in manufacturing electronics, optical devices, and protective coatings, allowing precise control over the coating properties and resulting in durable, high-performance thin films.