ICP etcher

An ICP etcher (Inductively Coupled Plasma etcher) is a device used in semiconductor manufacturing to precisely remove material from a wafer's surface. It creates a high-energy plasma using radio frequency energy, which contains charged particles that react with the material, etching away layers with great accuracy. This process allows for fine patterning and complex designs on tiny chips. The ICP technique offers better control, higher etch rates, and selectivity compared to traditional methods, making it an essential tool for producing advanced electronic components with precision.