extreme ultraviolet (EUV) lithography

Extreme Ultraviolet (EUV) lithography is an advanced manufacturing technology used to create tiny, intricate patterns on computer chips. It employs very short wavelengths of light—around 13.5 nanometers—which can produce much smaller features than traditional methods. EUV light is generated using specialized lasers and plasma sources, enabling the fabrication of more powerful and energy-efficient microprocessors. This process allows semiconductor manufacturers to continue shrinking chip components, enhancing performance while maintaining efficiency. EUV lithography is a key enabler for next-generation electronics, pushing the boundaries of how small and complex integrated circuits can become.