Atomic Layer Etching (ALE)

Atomic Layer Etching (ALE) is a precise process used in microfabrication to remove very thin layers of material from a surface at an atomic scale. It involves cycles of two steps: first, a chemical reaction modifies a specific layer, and then a gentle removal step selectively strips away just that layer without affecting the underlying material. This controlled, step-by-step approach allows for extremely accurate patterning and thinner features in electronic devices, improving performance and reducing defects. ALE is particularly valuable in producing the smallest, most advanced components in modern technology.