Anisotropic Etching

Anisotropic etching is a precise process used in manufacturing microstructures, such as in semiconductors, where material is removed at different rates depending on its crystal orientation. This controlled etching creates accurate, well-defined features by preferentially attacking specific directions of the material’s crystal lattice, resulting in shapes like V-shaped grooves or sharp edges. It’s essential for fabricating intricate devices with high precision, enabling the development of smaller, more efficient electronic components and microsystems.