193nm lithography

193 nm lithography is a technique used in semiconductor manufacturing to create tiny circuits on silicon wafers. It involves shining a focused ultraviolet light with a wavelength of 193 nanometers onto a photosensitive material called resist. The light exposes specific areas, allowing patterns to be transferred onto the wafer after development. This process enables the production of very small features, essential for making modern microchips. Despite its complexity, 193 nm lithography is a key technology that balances precision, cost, and manufacturing speed for producing advanced electronic devices.